SUBSTRATE CLEANING DEVICE AND SUBSTRATE CLEANING METHOD

WIPO Patent Application WO/2024/024474

A1

This substrate cleaning device comprises: a substrate rotation/retention unit that rotates a substrate while retaining the substrate; a first cleaning brush that has a first cleaning surface inclined so as to allow contact with a first bevel region of the substrate retained by the substrate rotation/retention unit; a first drive unit that is configured so as to shift the first cleaning brush between a first contact state, in which the first cleaning surface is in contact with the first bevel region of the substrate rotated by the substrate rotation/retention unit, and a first separated state, in which the first cleaning surface is separated from the first bevel region of the substrate rotated by the substrate rotation/retention unit; and a control unit that controls the first drive unit so that, if a first condition determined in advance has been met, the position of contact of the first cleaning surface with the first bevel region in the first contact state is changed.

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WO/2012/093610	PEELING SYSTEM, PEELING METHOD, AND COMPUTER STORAGE MEDIUM

TANAKA KATSUNORI (JP)
HOKAKU RYOHEI (JP)
YANO WATARU (JP)

PCT/JP2023/025415

February 01, 2024

July 10, 2023

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SCREEN HOLDINGS CO LTD (JP)

H01L21/304; B08B3/02

JP2007273607A	2007-10-18
JP2009123764A	2009-06-04
JPH10242092A	1998-09-11
JP2009032889A	2009-02-12
JP2011211246A	2011-10-20
JP2003031541A	2003-01-31

NAKAGAWA, Masahiro et al. (JP)

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