Title:
SPUTTERING TARGET
Document Type and Number:
WIPO Patent Application WO/2021/019992
Kind Code:
A1
Abstract:
The purpose of the present disclosure is to provide a sputtering target which is reduced in the contamination with fluorine element that is an impurity, and whereby it becomes possible to prevent the occurrence of fluorine-induced abnormal discharging and to form a thin film having good orientation properties when a thin film is formed using the sputtering target. The sputtering target of the present disclosure contains aluminum and further contains one or both of a rare earth element and a titanium-group element, and is characterized in that the content of fluorine is 100 ppm or less.
Inventors:
MARUKO TOMOHIRO (JP)
SUZUKI YU (JP)
OTOMO SHOHEI (JP)
NAKAMURA HIRONOBU (JP)
SUZUKI YU (JP)
OTOMO SHOHEI (JP)
NAKAMURA HIRONOBU (JP)
Application Number:
PCT/JP2020/025281
Publication Date:
February 04, 2021
Filing Date:
June 26, 2020
Export Citation:
Assignee:
FURUYA METAL CO LTD (JP)
International Classes:
C23C14/34; C22C1/04; C22C14/00; C22C16/00; C22C21/00; C22C27/00; C22C28/00; C22C30/00
Domestic Patent References:
| WO2017213185A1 | 2017-12-14 |
Foreign References:
| JPH08134635A | 1996-05-28 | |||
| JP2003166052A | 2003-06-13 | |||
| CN107841639A | 2018-03-27 | |||
| JP2001028348A | 2001-01-30 | |||
| JP2012012673A | 2012-01-19 | |||
| JP2015096647A | 2015-05-21 |
Other References:
KAZUHIKO KANO ET AL., DENSO TECHNICAL REVIEW, vol. 17, 2012, pages 202 - 207
See also references of EP 4006196A4
See also references of EP 4006196A4
Attorney, Agent or Firm:
IMASHITA, Katsuhiro et al. (JP)
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