Title:
SILICON PRECURSOR COMPOUND IN ASYMMETRIC STRUCTURE, METHOD FOR PREPARING THE SAME, AND METHOD FOR PREPARING A SILICON-CONTAINING THIN FILM
Document Type and Number:
WIPO Patent Application WO/2024/071976
Kind Code:
A1
Abstract:
The present invention relates to a silicon precursor compound in an asymmetric structure containing an alkoxide capable of preparing a silicon-containing thin film with high quality, to a method for preparing the same, and to a method for preparing a silicon-containing thin film using the silicon precursor compound in an asymmetric structure containing an alkoxide.
Inventors:
YANG BYEONG-IL (KR)
JEONG HEE-YEON (KR)
SEONG YEONG-JU (KR)
SEO JANG-WOO (KR)
CHEON SEONG-HAK (KR)
KIM JOO-YONG (KR)
BYUN YOUNG-HUN (KR)
JEONG HEE-YEON (KR)
SEONG YEONG-JU (KR)
SEO JANG-WOO (KR)
CHEON SEONG-HAK (KR)
KIM JOO-YONG (KR)
BYUN YOUNG-HUN (KR)
Application Number:
PCT/KR2023/014790
Publication Date:
April 04, 2024
Filing Date:
September 26, 2023
Export Citation:
Assignee:
MERCK PATENT GMBH (DE)
International Classes:
C23C16/40; C07F7/18; C23C16/34; C23C16/36; C23C16/455
Foreign References:
| JP2011018718A | 2011-01-27 | |||
| JP2018052862A | 2018-04-05 | |||
| KR20130087445A | 2013-08-06 | |||
| KR20160072011A | 2016-06-22 | |||
| KR20110009739A | 2011-01-31 |
Attorney, Agent or Firm:
FIRSTLAW P.C. (KR)
Download PDF: