Title:
SEWING PATH GENERATION SYSTEM AND METHOD, AND AUTOMATIC SEWING MACHINE HAVING SAME
Document Type and Number:
WIPO Patent Application WO/2024/025352
Kind Code:
A1
Abstract:
A sewing path generation system and a method therefor are disclosed. The sewing path generation system comprises: a light source unit, which is arranged to be sloped with respect to the normal line of a primary sewing line formed on a fabric, so as to emit light; and a vision unit for recognizing the primary sewing line on the basis of light reflected by the fabric, and generating a sewing path and sewing points for secondary sewing. Therefore, lighting is arranged asymmetrically at the top of the fabric and light is emitted such that a boundary line is recognized through the difference in the amount of light reflected from the fabric, and then the sewing path for the secondary sewing can be generated on the basis of the recognized primary sewing line.
Inventors:
PARK YONG LAE (KR)
KIM HO YOUNG (KR)
KU SU BYEONG (KR)
CHOI HYUN WOONG (KR)
PARK YOUNG CHUL (KR)
LEE JAE WON (KR)
KIM HO YOUNG (KR)
KU SU BYEONG (KR)
CHOI HYUN WOONG (KR)
PARK YOUNG CHUL (KR)
LEE JAE WON (KR)
Application Number:
PCT/KR2023/010890
Publication Date:
February 01, 2024
Filing Date:
July 27, 2023
Export Citation:
Assignee:
HOJEON LTD (KR)
SEOUL NAT UNIV R&DB FOUNDATION (KR)
SEOUL NAT UNIV R&DB FOUNDATION (KR)
International Classes:
D05B19/12; D05B27/22; D05B35/02; D06H3/08; G01N21/89; G06N3/045; G06T5/00; G06T7/00; G06T7/13; G06T7/136
Foreign References:
| KR20220084753A | 2022-06-21 | |||
| JPH0883343A | 1996-03-26 | |||
| KR102143354B1 | 2020-08-11 | |||
| JP2020185107A | 2020-11-19 | |||
| JP2003210879A | 2003-07-29 | |||
| KR102547281B1 | 2023-06-27 |
Attorney, Agent or Firm:
PARK, Young-Woo (KR)
Download PDF: