Title:
SCREEN MASK MANUFACTURING METHOD AND SCREEN MASK
Document Type and Number:
WIPO Patent Application WO/2024/048280
Kind Code:
A1
Abstract:
In this screen mask manufacturing method, a positive image formation step involves forming a recess-forming positive image in a position other than that of a pattern-opening-forming positive image on a side that will become a first surface, and/or a position other than that of the pattern-opening-forming positive image on a side that will become a second surface. A negative image formation step involves forming a negative image in a portion other than the pattern-opening-forming positive image and also other than the recess-forming positive image. A positive image removal step involves removing the pattern-opening-forming positive image and the recess-forming positive image so that due to the negative image, a first-surface-side recess that is recessed from the first surface to the front of the second surface and/or a second-surface-side recess that is recessed from the second surface to the front of the first surface is formed, in addition to the first surface, the second surface, and a pattern opening.
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Inventors:
KIMURA MIKI (JP)
OTA YUKO (JP)
OTA YUKO (JP)
Application Number:
PCT/JP2023/029604
Publication Date:
March 07, 2024
Filing Date:
August 16, 2023
Export Citation:
Assignee:
TAKEDA TOKYO PROCESS SERVICE CO LTD (JP)
International Classes:
B41C1/14; B41N1/24; G03F7/12
Foreign References:
| JP2008200958A | 2008-09-04 | |||
| JP2019214139A | 2019-12-19 | |||
| JP2017187601A | 2017-10-12 | |||
| JP2021172046A | 2021-11-01 | |||
| JPS6426446A | 1989-01-27 | |||
| JPH10326019A | 1998-12-08 | |||
| US5390595A | 1995-02-21 |
Attorney, Agent or Firm:
MATSUNUMA Yasushi et al. (JP)
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