Title:
RUTHENIUM COMPLEX, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING RUTHENIUM-CONTAINING THIN FILM
Document Type and Number:
WIPO Patent Application WO/2023/199853
Kind Code:
A1
Abstract:
The present invention provides a ruthenium complex which is useful for the production of a ruthenium-containing thin film under low temperature conditions in which an oxidizing gas is not used. The present invention provides a ruthenium complex which is represented by general formula (1). (In the formula, each of R1 and R2 independently represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; each of R3 and R4 represents a hydrogen atom or a group that combines with each other to form an alkylene group having 1 to 4 carbon atoms; and each of R5, R6 and R7 independently represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, a vinyl group or an allyl group.)
Inventors:
OIKE HIROYUKI (JP)
YAMAMOTO YUKI (JP)
FURUHASHI NAOTO (JP)
IKEMURA SHUYA (JP)
EBIHARA RYOSUKE (JP)
YAMAMOTO YUKI (JP)
FURUHASHI NAOTO (JP)
IKEMURA SHUYA (JP)
EBIHARA RYOSUKE (JP)
Application Number:
PCT/JP2023/014349
Publication Date:
October 19, 2023
Filing Date:
April 07, 2023
Export Citation:
Assignee:
TOSOH CORP (JP)
International Classes:
C07F19/00; C23C16/16; C23C16/18; H01L21/28; H01L21/285; C07F7/18; C07F15/00
Domestic Patent References:
| WO2011065221A1 | 2011-06-03 | |||
| WO2005035823A1 | 2005-04-21 | |||
| WO2021153639A1 | 2021-08-05 |
Foreign References:
| JP2011522124A | 2011-07-28 | |||
| JP2014037390A | 2014-02-27 | |||
| JP2005060814A | 2005-03-10 | |||
| JP2018172322A | 2018-11-08 |
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