RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AND POLYMER

WIPO Patent Application WO/2023/171743

A1

The present invention employs a resist composition containing a resin component that has a constituent unit derived from a compound represented by general formula (a0-1). In formula (a0-1), W01 is a polymerizable group-containing group, and RAr is an aromatic group. Ra0 is an acid-dissociable group represented by general formula (a0-r-1). Ra01 is an aliphatic hydrocarbon group; Ra02, Ra03, and Ra04 are a hydrocarbon group or a hydrogen atom. Ra01 and Ra02 may bind to each other to form an alicyclic structure. Ra03 and Ra04 may bind to each other to form an aromatic ring structure or an alicyclic structure. An alicyclic structure formed by Ra01 and Ra02 binding to each other and an aromatic ring structure or an alicyclic structure formed by Ra03 and Ra04 binding to each other may be condensed. Ra05 is a linear or alicyclic hydrocarbon group or a hydrogen atom.

SUZUKI ISSEI (JP)
NGUYEN KHANHTIN (JP)
ONISHI KOSHI (JP)

PCT/JP2023/009030

September 14, 2023

March 09, 2023

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TOKYO OHKA KOGYO CO LTD (JP)

G03F7/039; C08F12/02; C08F20/10; G03F7/20

JP2021067934A	2021-04-30
JP2010237662A	2010-10-21

PETERSEN MARTIN H., GEVORGYAN SUREN A., KREBS FREDERIK C.: "Thermocleavable Low Band Gap Polymers and Solar Cells Therefrom with Remarkable Stability toward Oxygen", MACROMOLECULES, AMERICAN CHEMICAL SOCIETY, US, vol. 41, no. 23, 9 December 2008 (2008-12-09), US , pages 8986 - 8994, XP093090223, ISSN: 0024-9297, DOI: 10.1021/ma801932a

TAZAKI Akira et al. (JP)

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