Title:
RADIATION-SENSITIVE COMPOSITION, RESIST-PATTERN-FORMING METHOD, RADIATION-SENSITIVE ACID GENERATOR AND POLYMER
Document Type and Number:
WIPO Patent Application WO/2024/057701
Kind Code:
A1
Abstract:
This radiation-sensitive composition comprises a polymer having an acid-dissociable group and a compound represented by formula (1). In formula (1), R5 is a group obtained by removing (m+n+2) hydrogen atoms from a monocyclic or condensed aromatic hydrocarbon ring having r carbon atoms. L− is –SO3
− or –COO−. r is an integer of 6 to 14. A1 is a single bond, –O–, –S– or –NR3–. R1 is a hydrogen atom or a monovalent organic group. X1 is a chlorine atom, a bromine atom or an iodine atom. m is an integer of 1 to (r–2). N is an integer of 0 to (r–3). R2 is a substituted or unsubstituted monovalent hydrocarbon. M+ is a monovalent cation.
Inventors:
TANIGUCHI TAKUHIRO (JP)
KIRIYAMA KAZUYA (JP)
KINOSHITA NATSUKO (JP)
NISHIKORI KATSUAKI (JP)
KIRIYAMA KAZUYA (JP)
KINOSHITA NATSUKO (JP)
NISHIKORI KATSUAKI (JP)
Application Number:
PCT/JP2023/026224
Publication Date:
March 21, 2024
Filing Date:
July 18, 2023
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
G03F7/004; C08F8/12; C08F20/22; C08F20/38; C08F212/14; C08F220/12; C09K3/00; G03F7/039; G03F7/20
Domestic Patent References:
| WO2017130629A1 | 2017-08-03 |
Foreign References:
| JP2017219836A | 2017-12-14 | |||
| JP2006049676A | 2006-02-16 | |||
| JP2013167826A | 2013-08-29 |
Attorney, Agent or Firm:
YAMADA, Tsuyoshi (JP)
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