Title:
PURIFICATION METHOD FOR ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN-FORMING METHOD, AND PRODUCTION METHOD FOR ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/262134
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing a purification method for an actinic ray-sensitive or radiation-sensitive resin composition which can be used to form a pattern in which defects are inhibited. The present invention also addresses another problem of providing: a pattern-forming method including a purification step based on the purification method; and a method for producing an electronic device using the pattern-forming method. The purification method according to the present invention is for an actinic ray-sensitive or radiation-sensitive resin composition containing at least a resin having polarity which increases due to action of an acid, a compound which generates an acid due to irradiation with an actinic ray or a radiation, and a solvent, wherein the compound which generates an acid due to irradiation with an actinic ray or a radiation, includes one or more compounds selected from the group consisting of compounds (I)-(III), and the method comprises step X for filtering the actinic ray-sensitive or radiation-sensitive resin composition through two or more filters.
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Inventors:
TANGO NAOHIRO (JP)
YAMAMOTO KEI (JP)
OU KEIYU (JP)
YAMAMOTO KEI (JP)
OU KEIYU (JP)
Application Number:
PCT/JP2020/023711
Publication Date:
December 30, 2020
Filing Date:
June 17, 2020
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
C07C25/18; C07C381/12; C07D217/08; C07D285/15; C07D295/26; C07D327/04; C07D327/06; C07D333/46; C07D411/06; C07D493/18; G03F7/004; G03F7/038; G03F7/039; G03F7/20; G03F7/26; H01L21/027
Domestic Patent References:
| WO2019013155A1 | 2019-01-17 |
Foreign References:
| JP2014149409A | 2014-08-21 | |||
| JP2015024989A | 2015-02-05 | |||
| JP2010164980A | 2010-07-29 |
Attorney, Agent or Firm:
ITOH Hideaki et al. (JP)
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