Title:
PROBE TREATMENT METHOD AND PROBE
Document Type and Number:
WIPO Patent Application WO/2024/021198
Kind Code:
A1
Abstract:
Embodiments of the present description provide a probe treatment method and a probe. The probe treatment method comprises: covering a photosensitive film, exposing a probe part to be treated, developing the exposed probe part, and electroplating the developed probe part using a rhodium plating solution. By means of first covering the photosensitive film, then exposing the probe part to be treated, and developing the exposed part to be treated, accurate positioning of the probe to be treated is ensured. Using a rhodium plating solution to electroplate the developed probe part can complete partial plating of the probe, saving electroplating costs. The treated probe has good electrical conductivity, and at the same time the hardness of the treated probe part is increased, and the service life of the probe is ensured.
Inventors:
HAN YANGYANG (CN)
TAO KEWEN (CN)
LUO XIONGKE (CN)
TAO KEWEN (CN)
LUO XIONGKE (CN)
Application Number:
PCT/CN2022/113290
Publication Date:
February 01, 2024
Filing Date:
August 18, 2022
Export Citation:
Assignee:
SHANGHAI ZEFENG SEMICONDUCTOR TECH CO LTD (CN)
International Classes:
C25D5/02; G01R1/067
Foreign References:
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| KR20060106076A | 2006-10-12 | |||
| US20020047721A1 | 2002-04-25 | |||
| KR102201705B1 | 2021-01-12 | |||
| CN103270422A | 2013-08-28 | |||
| CN101002103A | 2007-07-18 | |||
| CN107297020A | 2017-10-27 | |||
| CN111812366A | 2020-10-23 | |||
| CN113391101A | 2021-09-14 | |||
| CN113562686A | 2021-10-29 | |||
| CN114016100A | 2022-02-08 | |||
| TWI221191B | 2004-09-21 |
Attorney, Agent or Firm:
BEIJING CHINACERCIS INTELLECTUAL PROPERTY CO., LTD. (CN)
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