Title:
POLY(P-HYDROXYSTYRENE) EPOXY RESIN, AND SYNTHESIS AND USE THEREOF
Document Type and Number:
WIPO Patent Application WO/2018/205818
Kind Code:
A1
Abstract:
The present invention relates to a polymer of formula (I), wherein Ra-Rd, Ra0-Rd0, Ra1-Rd1, Ra2-Rd2, n, n0, n1 and n2 are as defined in the description. When the polymer is used as a film-forming resin for a photoresist, same has the following advantages: a good ultraviolet light transmittance, a large viscosity, being capable of forming a thick film, a fast photosensitive speed, a high resolution, etc. The present invention further relates to a method for preparing the polymer of formula (I), the use of the polymer of formula (I) as a film-forming resin in a photoresist, and a photoresist comprising the polymer of formula (I) as a film-forming resin.
Inventors:
ZOU YINGQUAN (CN)
GUO YEJIA (CN)
WANG ZHENG (CN)
PANG YULIAN (CN)
GUO YEJIA (CN)
WANG ZHENG (CN)
PANG YULIAN (CN)
Application Number:
PCT/CN2018/083911
Publication Date:
November 15, 2018
Filing Date:
April 20, 2018
Export Citation:
Assignee:
HUBEI GURUN TECH CO (CN)
International Classes:
C08F12/24; C08F8/08; C08G59/20; G03C1/72; G03F7/00
Domestic Patent References:
| WO2008085513A1 | 2008-07-17 | |||
| WO2000064955A1 | 2000-11-02 |
Foreign References:
| JPS59175483A | 1984-10-04 | |||
| JPS61120822A | 1986-06-07 | |||
| JPS60134234A | 1985-07-17 | |||
| CN101643525A | 2010-02-10 | |||
| CN102391406A | 2012-03-28 | |||
| CN105924553A | 2016-09-07 |
Other References:
See also references of EP 3636678A4
Attorney, Agent or Firm:
ZHONGZI LAW OFFICE (CN)
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