Title:
POLYACETAL RESIN COMPOSITION AND PRODUCTION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2020/261693
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide: a polyacetal resin composition that has excellent weather resistance, that can be used to form a molded article inhibiting the occurrence of formaldehyde to a very low level, and that has stably inhibited mold deposit during molding; and a production method for the polyacetal resin composition. The purpose of the present invention was achieved by this polyacetal resin composition containing at least (A) 100 parts by mass of a polyacetal polymer, (B) 0.03-0.30 parts by mass of a hindered phenol antioxidant, (C) 0.01-0.50 parts by mass of an aliphatic carboxylic acid hydrazide, (D) 0.001-0.50 parts by mass of a hydantoin compound having two hydrazinocarbonylalkyl groups, (E) 0.001-0.30 parts by mass of an alkaline-earth metal salt of an aliphatic carboxylic acid, (F) 0.2-1.0 parts by mass of a hindered amine compound, and (G) 0.2-1.0 parts by mass of a UV absorbent, wherein the total amount of (C) and (D) is 0.03-0.55 parts by mass with respect to (A) 100 parts by mass of the polyacetal polymer.
Inventors:
TAMAOKA AKIHIRO (JP)
MONMA TOMOHIRO (JP)
HARASHINA HATSUHIKO (JP)
MONMA TOMOHIRO (JP)
HARASHINA HATSUHIKO (JP)
Application Number:
PCT/JP2020/015143
Publication Date:
December 30, 2020
Filing Date:
April 02, 2020
Export Citation:
Assignee:
POLYPLASTICS CO (JP)
International Classes:
C08G2/10; C08K3/08; C08K5/098; C08K5/10; C08K5/13; C08K5/20; C08K5/25; C08K5/3435; C08K5/3445; C08K5/3475; C08L59/00; C08L71/02
Foreign References:
| JPH06345937A | 1994-12-20 | |||
| JP2011140577A | 2011-07-21 |
Attorney, Agent or Firm:
SHOBAYASHI Masayuki et al. (JP)
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