Title:
PHOTOSENSITIVE SURFACE TREATMENT AGENT, LAMINATE, TRANSISTOR, PATTERN FORMATION METHOD, AND TRANSISTOR MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2023/022042
Kind Code:
A1
Abstract:
A photosensitive surface treatment agent comprising a compound represented by formula (1) or a high molecular weight compound derived from formula (1). [In formula (1), R1 represents a hydrogen atom or an alkyl group having 1-5 carbon atoms, R2 and R3 each independently represent an alkyl group having 1-3 carbon atoms or a fluoroalkyl group having 1-13 carbon atoms, R4 represents a hydrogen atom or a nitro group, n1 represents 0 or 1, Y represents a polymerizable group-containing group or a linear or branched alkyl group having 1-20 carbon atoms.]
Inventors:
KAWAKAMI YUSUKE (JP)
YAMAGUCHI KAZUO (JP)
ITOU MICHIKO (JP)
YAMAGUCHI KAZUO (JP)
ITOU MICHIKO (JP)
Application Number:
PCT/JP2022/030265
Publication Date:
February 23, 2023
Filing Date:
August 08, 2022
Export Citation:
Assignee:
NIKON CORP (JP)
International Classes:
G03F7/004; C07C323/16; C07C329/06; C08F20/38; G03F7/38; H01L21/288; H01L21/336; H01L29/786
Domestic Patent References:
| WO2011105249A1 | 2011-09-01 |
Foreign References:
| JP2009249468A | 2009-10-29 | |||
| JP2019073495A | 2019-05-16 |
Attorney, Agent or Firm:
NISHIZAWA Kazuyoshi et al. (JP)
Download PDF:
Previous Patent: ELECTROSTATIC CHUCK, SUBSTRATE SUPPORT DEVICE, AND SUBSTRATE PROCESSING DEVICE
Next Patent: VEHICLE WHEEL BEARING DEVICE
Next Patent: VEHICLE WHEEL BEARING DEVICE