PATTERN FORMATION METHOD AND ARTICLE PRODUCTION METHOD

Title:

PATTERN FORMATION METHOD AND ARTICLE PRODUCTION METHOD

Document Type and Number:

WIPO Patent Application WO/2023/140030

Kind Code:

A1

Abstract:

This pattern formation method comprises: a contacting step for bringing a curable composition arranged on a field of a substrate and containing a polymerizable compound into contact with a mold; a curing step for irradiating the curable composition arranged on the field with light to form a cured film including a pattern formed from a cured object of the curable composition; and a separation step for separating the cured film and the mold from each other. The field includes a plurality of regions. In the curing step, the curable composition is irradiated with light in accordance with a lighting intensity and a lighting time both determined according to a target line width of the pattern with respect to each of the plurality of regions.

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Inventors:

KAWATA ISAO (JP)
ITO TOSHIKI (JP)
ITO YUTO (JP)

Application Number:

PCT/JP2022/047154

Publication Date:

July 27, 2023

Filing Date:

December 21, 2022

Export Citation:

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Assignee:

CANON KK (JP)

International Classes:

B29C59/02; H01L21/027

Foreign References:

JP2021034562A	2021-03-01
JP2015173271A	2015-10-01
JP2014175434A	2014-09-22
JP2011061001A	2011-03-24
JP2010103415A	2010-05-06