Title:
ONIUM SALT, PHOTOACID GENERATOR, POLYMER, RESIST COMPOSITION, AND METHOD FOR MANUFACTURING DEVICE USING SAID RESIST COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2024/070091
Kind Code:
A1
Abstract:
Provided are: a compound suitable for use as a photoacid generator for resist compositions that has favorable sensitivity to actinic energy such as EB and EUV, has excellent resolution in lithography, and can reduce line width roughness (LWR) in fine patterns; and a resist composition containing said compound. Provided is an onium salt of formula (1). In formula (1), A- is a sulfonic acid anion or a carboxylic acid anion, and Q is any selected from the group consisting of a hydrogen atom; a fluorine atom; and linear, branched, or cyclic alkyl groups having 1-30 carbon atoms that may have a substituent. T is selected from the group consisting of a single bond; linear, branched, or cyclic alkylene groups having 1-30 carbon atoms that may have a substituent; linear, branched, or cyclic alkenylene groups having 2-30 carbon atoms that may have a substituent; arylenes group having 5-30 carbon atoms that may have a substituent; and heteroarylene groups having 3-30 carbon atoms that may have a substituent. L is a single bond or a divalent heteroatom-containing group. Z is a group represented by formula (2) and bonds with the L in place of any one hydrogen atom in said formula (2). M+ is a monovalent onium cation. In formula (2), G is selected from the group consisting of -CO-, -C(=S)-, and -C(R1)2-. The two R1s may be the same or may be different. The two R1s may form a ring structure by the R1s bonding to each other directly by a single bond or through any one intermediary selected from the group consisting of an oxygen atom, a sulfur atom, and alkylene groups.
Inventors:
HARA DAISUKE (JP)
IZUMISAWA YUTA (JP)
UTSUMI YOSHIYUKI (JP)
IZUMISAWA YUTA (JP)
UTSUMI YOSHIYUKI (JP)
Application Number:
PCT/JP2023/023555
Publication Date:
April 04, 2024
Filing Date:
June 26, 2023
Export Citation:
Assignee:
TOYO GOSEI CO LTD (JP)
International Classes:
C07C61/40; C07C309/11; C07C309/12; C07C309/13; C07C309/17; C07C381/12; C08F12/00; C08F20/12; G03F7/004; G03F7/20
Domestic Patent References:
| WO2022196258A1 | 2022-09-22 | |||
| WO2021220648A1 | 2021-11-04 |
Foreign References:
| US20210263411A1 | 2021-08-26 | |||
| JP2020148870A | 2020-09-17 | |||
| JP2018005224A | 2018-01-11 | |||
| JP2018025789A | 2018-02-15 | |||
| JP2021096433A | 2021-06-24 | |||
| JP2021091666A | 2021-06-17 |
Attorney, Agent or Firm:
KURIHARA, Hiroyuki et al. (JP)
Download PDF:
Previous Patent: SOLID-STATE REFRIGERATION DEVICE
Next Patent: MANUFACTURING DEVICE FOR MIXTURE SHEET
Next Patent: MANUFACTURING DEVICE FOR MIXTURE SHEET