OBJECTIVE LENS SYSTEM FOR SCANNING ELECTRON MICROSCOPE, AND SCANNING FOCUSING METHOD

WIPO Patent Application WO/2024/083068

A1

Provided in the embodiments of the present disclosure are an objective lens system for a scanning electron microscope, and a scanning focusing method. The objective lens system comprises a magnetic lens, a first deflection apparatus, a detection apparatus, a second deflection apparatus and a sample stage, wherein the magnetic lens comprises a main body portion and a magnetically conductive pole piece; the first deflection apparatus is located between an inner wall of the main body portion and an optical axis of an electron beam, and is used for changing a motion direction of an incident electron beam; the detection apparatus is located between the first deflection apparatus and the second deflection apparatus, and is used for receiving signal electrons generated by means of the electron beam acting on a sample under test on the sample stage; the second deflection apparatus is located between the main body portion and the magnetically conductive pole piece, and is used for changing the motion direction of the electron beam; the detection apparatus, the second deflection apparatus, the magnetically conductive pole piece and the sample stage form an electrostatic lens; and the electrostatic lens and the magnetic lens form a composite lens, which is used for focusing the electron beam.

LI SHUAI (CN)

PCT/CN2023/124704

April 25, 2024

October 16, 2023

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FOCUS E BEAM TECH BEIJING CO LTD (CN)

H01J37/14

CN116190184A	2023-05-30
CN207425790U	2018-05-29
CN115410888A	2022-11-29
CN108231511A	2018-06-29
CN114171361A	2022-03-11
CN106920723A	2017-07-04
CN108807118A	2018-11-13
US20020185599A1	2002-12-12

LEADER PATENT & TRADEMARK FIRM (CN)

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