Title:
MONOMER COMPOSITION AND METHOD FOR PRODUCING SAME, AND COSMETIC OR COSMETIC RAW MATERIAL INCLUDING MONOMER COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2022/138329
Kind Code:
A1
Abstract:
[Problem] To provide a monomer composition that poses no concern about safety when used as a raw material of a cosmetic, etc. and does not trigger a decrease in quality such as gelation, and a method for producing the same. [Solution] A monomer composition including a radical polymerizable monomer having an organic group capable of radical polymerization and an organic silicon-containing organic group in the molecule, wherein the total concentration of polymerization inhibitor to the total mass of the radical polymerizable monomer and polymerization inhibitor is 130 mass ppm or less, and a method for producing the same.
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Inventors:
AKIYAMA KATSUHIRO (JP)
SOUDA TATSUO (JP)
SUGIURA TSUNEHITO (JP)
SOUDA TATSUO (JP)
SUGIURA TSUNEHITO (JP)
Application Number:
PCT/JP2021/046061
Publication Date:
June 30, 2022
Filing Date:
December 14, 2021
Export Citation:
Assignee:
DOW TORAY CO LTD (JP)
International Classes:
C08F30/08; A61K8/893; A61Q1/00; A61Q5/06; A61Q19/10; C07F7/08; C08F2/38
Domestic Patent References:
WO2013118766A1 | 2013-08-15 |
Foreign References:
JPH0525188A | 1993-02-02 | |||
JP2005239889A | 2005-09-08 | |||
JP2004115790A | 2004-04-15 | |||
JP2006169234A | 2006-06-29 | |||
JP2020145328A | 2020-09-10 | |||
JP2014040512A | 2014-03-06 | |||
JP2004115790A | 2004-04-15 | |||
JP2006169234A | 2006-06-29 | |||
US5654362A | 1997-08-05 | |||
JP2011149017A | 2011-08-04 | |||
JP4009382B2 | 2007-11-14 | |||
JP2000063225A | 2000-02-29 | |||
JP2007532754W |
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