Title:
MONOMER COMPOSITION, METHACRYLIC RESIN COMPOSITION AND PRODUCTION METHOD THEREFOR, AND MOLDED RESIN OBJECT
Document Type and Number:
WIPO Patent Application WO/2024/090576
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing: a monomer composition for obtaining a methacrylic resin composition excellent in terms of light stability or long-term thermal stability while retaining the transparency and heat resistance inherent in methacrylic resins; a methacrylic resin composition and a method for producing same; and a molded resin object including a methacrylic resin composition. The problem is solved with: a monomer composition comprising methyl methacrylate and containing an ester compound (component A1) having a specific α hydrogen atom, an α,β-unsaturated carbonyl compound (component A21), an α,β-unsaturated carboxylic acid ester (component A22), or a pyrazine compound (component A3) in an amount of 1-10,000 ppm by mass; a methacrylic resin composition obtained using the monomer composition; a method for producing the methacrylic resin composition; and a molded resin object comprising the methacrylic resin composition.
Inventors:
SUZUKI TATSUYA (JP)
FUJITA SHIHO (JP)
KURIHARA YU (JP)
ISOMURA MANABU (JP)
KATOU YUUKI (JP)
KANEMORI KOUICHI (JP)
NARUYOSHI WATARU (JP)
FUJITA SHIHO (JP)
KURIHARA YU (JP)
ISOMURA MANABU (JP)
KATOU YUUKI (JP)
KANEMORI KOUICHI (JP)
NARUYOSHI WATARU (JP)
Application Number:
PCT/JP2023/038977
Publication Date:
May 02, 2024
Filing Date:
October 27, 2023
Export Citation:
Assignee:
MITSUBISHI CHEM CORP (JP)
International Classes:
C08F220/14; C08F20/14; C08K5/00; C08K5/3462; C08L33/12
Attorney, Agent or Firm:
TAZAKI Akira et al. (JP)
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