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Patent Searching and Data


Title:
MICROWAVE PLASMA CVD DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/238826
Kind Code:
A1
Abstract:
A microwave plasma CVD device (1) comprises: a chamber (10A); a loading platform (110A) that is provided in a center portion of the chamber (10A) in plan view of the chamber (10A); a coaxial structural portion (80A) that is located in the center portion of the chamber (10A) in plan view of the chamber (10A), that includes a center conductor (81) which is parallel to the axial direction of a symmetric axis in an internal resonance mode of the chamber (10A), and that includes an external conductor (82) positioned around the center conductor (81); a plurality of microwave introduction ports (20), (20) … that are provided in the coaxial structural portion (80A) of the chamber (10A) and are connected so as to match the internal resonance mode of the chamber (10A); and a microwave introduction window (30A) that uses the chamber (10A) and a waveguide portion (40A) as pressure bulkheads and that transmits microwaves.

Inventors:
YAMADA HIDEAKI (JP)
CHAYAHARA AKIYOSHI (JP)
MOKUNO YOSHIAKI (JP)
Application Number:
PCT/JP2023/020843
Publication Date:
December 14, 2023
Filing Date:
June 05, 2023
Export Citation:
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Assignee:
AIST (JP)
International Classes:
H01P1/16; C01B32/26; C23C16/511; C30B29/04; H01L21/205; H01P5/103; H05H1/46
Domestic Patent References:
WO2011090076A12011-07-28
Foreign References:
JP3483147B22004-01-06
JP2012190899A2012-10-04
JPH09270386A1997-10-14
JPH09106900A1997-04-22
Attorney, Agent or Firm:
NISHIZAWA Kazuyoshi et al. (JP)
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