Title:
METHOD FOR PRODUCING MASK, MASK, METHOD FOR FORMING DEPOSITED LAYER, AND METHOD FOR PRODUCING ORGANIC SEMICONDUCTOR ELEMENT
Document Type and Number:
WIPO Patent Application WO/2024/071315
Kind Code:
A1
Abstract:
This method for producing a mask comprises: a laminate preparation step for preparing a laminate including a laser-blocking layer that contains a plurality of light-transmitting holes and a resin layer that covers the laser-blocking layer; and a laser processing step for allowing laser light to enter the laminate toward the laser-blocking layer to form, in the resin layer, a plurality of first openings corresponding to the plurality of light-transmitting holes in the laser-blocking layer.
Inventors:
KAWASAKI HIROSHI (JP)
OBATA KATSUNARI (JP)
AIDA KAZUHIKO (JP)
OBATA KATSUNARI (JP)
AIDA KAZUHIKO (JP)
Application Number:
PCT/JP2023/035459
Publication Date:
April 04, 2024
Filing Date:
September 28, 2023
Export Citation:
Assignee:
DAINIPPON PRINTING CO LTD (JP)
International Classes:
C23C14/04; C23C14/12; C23C14/14; C23C14/24; H05B33/10; H10K50/10
Foreign References:
| JP2020026543A | 2020-02-20 | |||
| JP2018168475A | 2018-11-01 |
Attorney, Agent or Firm:
MIYAJIMA Manabu et al. (JP)
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