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Patent Searching and Data


Title:
MEGASONIC CLEANING SYSTEM FOR LARGE-SIZED WAFER
Document Type and Number:
WIPO Patent Application WO/2023/134313
Kind Code:
A1
Abstract:
The present application relates to the technical field of semiconductor cleaning, and provides a megasonic cleaning system for a large-sized wafer, comprising: a seat body; a rotating seat, which is rotatably arranged on the seat body; an oscillator, which is connected to the rotating seat; a first driving mechanism, which is used for driving the rotating seat to rotate; a transducer apparatus, which is used for carrying out acoustoelectric conversion and which is connected to the oscillator; a second driving mechanism, which is used for connecting to a first end face of the wafer and driving the wafer to rotate, wherein the second driving mechanism is arranged opposite to the oscillator so that a second end face of the wafer faces the oscillator and is opposite to an operating trajectory of the transducer apparatus; a liquid conveying mechanism, which is provided with a liquid outlet that faces the oscillator; and a control assembly, which is connected to the transducer apparatus and is used for controlling the magnitude of sound energy emitted by the transducer apparatus so as to subject the wafer to uniform sound wave energy. The wafer is scanned in a rotating and moving mode, the size of the transducer apparatus does not need to match that of the wafer, and the fabrication difficulty of a piezoelectric ceramic piece may be reduced.

Inventors:
XIAN WEI (CN)
XIAN SHOURONG (CN)
Application Number:
PCT/CN2022/134700
Publication Date:
July 20, 2023
Filing Date:
November 28, 2022
Export Citation:
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Assignee:
SIANSONIC TECH LIMITED (CN)
International Classes:
B08B3/12; B08B3/02; H01L21/67
Foreign References:
CN114054429A2022-02-18
CN202638797U2013-01-02
CN106340477A2017-01-18
CN101540269A2009-09-23
US20070137672A12007-06-21
CN110976377A2020-04-10
JP2002124504A2002-04-26
Attorney, Agent or Firm:
CN-KNOWHOW INTELLECTUAL PROPERTY AGENT LIMITED (CN)
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