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Patent Searching and Data


Title:
MACHINE LEARNING DEVICE, SUBSTRATE PROCESSING DEVICE, TRAINED MODEL, MACHINE LEARNING METHOD, AND MACHINE LEARNING PROGRAM
Document Type and Number:
WIPO Patent Application WO/2021/054236
Kind Code:
A1
Abstract:
The present invention comprises: a state information acquisition unit that acquires state information including the position of a substrate within the device and the time spent thereby in various units; an action selection part that has a prediction model for predicting action performance values for whether to retrieve a new substrate from a cassette in a given state and for which processing unit to convey the substrate to, and that selects one action on the basis of the prediction model by using the acquired state information as input; an instructions signal transmitting part that transmits an instructions signal to perform the selected action; an operation results acquisition part that acquires operation results including processed substrate count and wait time; and a prediction model updating part that calculates a reward on the basis of the acquired operation results so that the reward increases as the number of processed substrates increases and the wait time decreases, and updates the prediction model on the basis of the reward.

Inventors:
NAKAMURA AKIRA (JP)
NAKAMURA TAKAMASA (JP)
TORIKOSHI TSUNEO (JP)
OTAKI HIROFUMI (JP)
Application Number:
PCT/JP2020/034234
Publication Date:
March 25, 2021
Filing Date:
September 10, 2020
Export Citation:
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Assignee:
EBARA CORP (JP)
International Classes:
B24B51/00; B24B37/005; G06N20/00; H01L21/304
Domestic Patent References:
WO2008133286A12008-11-06
Foreign References:
JP2019040984A2019-03-14
JP2015199181A2015-11-12
JP2010027701A2010-02-04
JP2012074574A2012-04-12
JP2009004442A2009-01-08
JP2005109437A2005-04-21
JP2010087135A2010-04-15
JP2018186203A2018-11-22
JP2008091698A2008-04-17
Attorney, Agent or Firm:
OHNO Seiji et al. (JP)
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