Title:
LOCAL OBSERVATION METHOD, PROGRAM, RECORDING MEDIUM, AND ELECTRONIC RAY APPLICATION DEVICE
Document Type and Number:
WIPO Patent Application WO/2024/096008
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing a local observation method in which, when a first area-to-be-irradiated is irradiated with an electronic beam, a second area, which is influenced by same, can be locally observed, and an electron beam application device for executing the location observation method. Provided is a local observation method for an object-to-be-irradiated in an electron beam application device, wherein, when a first area-to-be-irradiated is irradiated with an electron beam, the method is for observing a second area influenced by same. The electron beam application device comprises: a light source; a photocathode which generates, in response to receiving excitation light irradiated from the light source, electrons capable of being emitted; an anode which can form an electric field with the photocathode, draws, by means of the formed electric field, the electrons capable of being emitted, and forms the electron beam; a detector which detects emissions emitted from the object-to-be-irradiated that has been irradiated with the electron beam, and generates a detection signal; and a control unit. The local observation method causes the control unit to execute: a position information setting step for setting position information about the first area and the second area in the object-to-be-irradiated; a first electron beam parameter setting step for setting parameters of the electron beam to irradiate the first area; a first electron beam irradiation condition setting step for setting, on the basis of a positional relationship between the first area and the second area, irradiation conditions of the electron beam that is to irradiate the first area and has the first electron beam parameters and the electron beam to irradiate the second area; an electron beam irradiation step for irradiating the first area and the second area with the electron beams on the basis of the irradiation conditions set in the first electron beam irradiation condition setting step; and a detection step for detecting, by means of the detector, emission amounts of the emissions emitted from the first and second areas irradiated with the electron beam, and generating the detection signal.
Inventors:
NISHITANI TOMOHIRO (JP)
ARAKAWA YUTA (JP)
ARAKAWA YUTA (JP)
Application Number:
PCT/JP2023/039260
Publication Date:
May 10, 2024
Filing Date:
October 31, 2023
Export Citation:
Assignee:
PHOTO ELECTRON SOUL INC (JP)
International Classes:
H01J37/073; H01J37/22
Domestic Patent References:
| WO2022091180A1 | 2022-05-05 |
Foreign References:
| JP2021082487A | 2021-05-27 | |||
| JP2013206641A | 2013-10-07 | |||
| JP2021025959A | 2021-02-22 | |||
| JP7054281B1 | 2022-04-13 |
Attorney, Agent or Firm:
MATSUMOTO Seiji (JP)
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