Title:
LAMINATED RADIATION LIGHT SOURCE
Document Type and Number:
WIPO Patent Application WO/2019/225726
Kind Code:
A1
Abstract:
Provided is a radiation light source capable of adjusting radiation infrared light to a very narrow band. This laminated radiation light source is formed by laminating a plasmonic reflection layer made of a plasmonic material, a resonant layer made of an insulator, and a partial reflection layer in this order, wherein the partial reflection layer is any one among a free interface, an ultra-thin metal layer, and a distributed reflection layer in which layers having different refractive indexes are alternately laminated. When a highly temperature-resistant material such as SiC is used as the material of the outermost layer of the distributed reflection layer, the laminated radiation light source can be operated at a high temperature of, for example, 550°C or higher.
Inventors:
NAGAO TADAAKI (JP)
DOAN TUNG ANH (JP)
DAO DUY THANG (JP)
ISHII SATOSHI (JP)
DOAN TUNG ANH (JP)
DAO DUY THANG (JP)
ISHII SATOSHI (JP)
Application Number:
PCT/JP2019/020572
Publication Date:
November 28, 2019
Filing Date:
May 24, 2019
Export Citation:
Assignee:
NAT INST MATERIALS SCIENCE (JP)
International Classes:
H01K1/14; H01K1/04; H01K7/00
Domestic Patent References:
| WO2005041246A1 | 2005-05-06 |
Foreign References:
| JP2016065786A | 2016-04-28 | |||
| JP2014216132A | 2014-11-17 | |||
| JP2014143053A | 2014-08-07 |
Attorney, Agent or Firm:
TSUZUKI Noriaki (JP)
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