INTEGRATED APPARATUS AND MANUFACTURING METHOD THEREFOR, AND INTEGRATED CIRCUIT, DETECTION APPARATUS AND TERMINAL

WIPO Patent Application WO/2024/087176

A1

The present application relates to the technical field of electronics. Provided are an integrated apparatus and a manufacturing method therefor, and an integrated circuit, a detection apparatus and a terminal, which are used for reducing parasitism introduced in an integrated apparatus, so as to improve the effective energy conversion efficiency of the integrated apparatus. The detection apparatus may be a LiDAR. The integrated apparatus comprises: a laser, which comprises an anode, a cathode and a first substrate; and a capacitor, which comprises a second substrate, an insulating layer and a comb-shaped first metal layer, the insulating layer being attached to the first metal layer, wherein the first substrate is in contact with the second substrate, such that the distance between the laser and the capacitor is reduced by means of a stereoscopic layout; and the anode is embedded in the first substrate and is connected to the second substrate, such that interconnection between the laser and the capacitor is realized, and therefore it is not necessary to provide an extra interconnection trace between the laser and the capacitor, thereby greatly reducing parasitism introduced in the integrated apparatus.

ZHANG YI (CN)
CAI ZHONGHUA (CN)
ZHONG GUOWEI (CN)

PCT/CN2022/128285

May 02, 2024

October 28, 2022

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HUAWEI TECH CO LTD (CN)

H05B33/02; H01S5/0233

WO2007085554A2

2007-08-02

JP2009116164A	2009-05-28
US6690110B1	2004-02-10
JPH04367828A	1992-12-21
CN114223102A	2022-03-22
KR20210021709A	2021-03-02

BEIJING ZBSD PATENT & TRADEMARK AGENT LTD. (CN)

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