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Patent Searching and Data


Title:
INTEGRATED APPARATUS, MANUFACTURING METHOD, DETECTION APPARATUS AND TERMINAL
Document Type and Number:
WIPO Patent Application WO/2024/087187
Kind Code:
A1
Abstract:
The present application relates to the technical field of electronics. Provided are an integrated apparatus, a manufacturing method, a detection apparatus and a terminal, which are used for reducing the parasitism introduced into the integrated apparatus, so as to improve the effective energy conversion efficiency of the integrated apparatus. The detection apparatus may be a lidar. The integrated apparatus comprises: a base, which is provided with at least two etching layers which are alternately arranged in a stacked manner; and a laser, which is located on the base, wherein at least one filling structure is provided on the side of the base that is away from the laser, the base and the filling structure may form a capacitor, the filling structure comprises an insulating layer and a first metal layer, and the height of the filling structure is less than the thickness of the base. The laser and the capacitor are arranged on the same base, such that the distance between the laser and the capacitor can be reduced by means of a stereoscopic layout, and the interconnection between the laser and the capacitor is also realized, thereby greatly reducing the parasitism introduced into the structure of the integrated apparatus.

Inventors:
ZHANG YI (CN)
CAI ZHONGHUA (CN)
ZHONG GUOWEI (CN)
Application Number:
PCT/CN2022/128334
Publication Date:
May 02, 2024
Filing Date:
October 28, 2022
Export Citation:
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Assignee:
HUAWEI TECH CO LTD (CN)
International Classes:
H01L23/522; G01S17/02
Foreign References:
CN113809041A2021-12-17
CN115241162A2022-10-25
CN114342063A2022-04-12
CN114664808A2022-06-24
US20200105664A12020-04-02
Attorney, Agent or Firm:
BEIJING ZBSD PATENT&TRADEMARK AGENT LTD. (CN)
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