INSPECTION DEVICE, INSPECTION METHOD, AND INSPECTION PROGRAM

WIPO Patent Application WO/2024/090109

A1

The present invention comprises: a light irradiation unit 2 that irradiates a light-transmissive and film-like test object W with inspection light L1; a scattered light detection unit 3 for detecting scattered light L2 which is produced from the test object W; a diffracted light detection section 4 for detecting diffracted light L3 which is produced from the test object W; and a signal processing unit 5 that determines, on the basis of a scattered light intensity signal from the scattered light detection unit 3 and a diffracted light intensity signal from the diffracted light detection unit 4, the presence or absence of foreign matter S which has adhered to the test object W and the presence or absence of a pinhole P which has been formed in the test object W.

JP2006317693	EXPOSURE METHOD, EXPOSURE MASK, AND PROTECTING FILM FOR MASK
JP3717887	METHOD OF MANUFACTURING PELLICLE AND MANUFACTURING APPARATUS FOR PELLICLE
WO/2014/188710	PELLICLE AND EUV EXPOSURE DEVICE COMPRISING SAME

SOMEYA SHOTA (JP)
IIDA HIROSHI (JP)
KANZAKI TOYOKI (JP)
NAKAGAWA KAZUYA (JP)

PCT/JP2023/035235

May 02, 2024

September 27, 2023

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HORIBA LTD (JP)

G03F1/62; G01N21/894

JP2009270909A	2009-11-19
JPH06138045A	1994-05-20
JP2009145141A	2009-07-02
JP2013044578A	2013-03-04
JP2002296197A	2002-10-09

NISHIMURA, Ryuhei et al. (JP)

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