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Title:
INK COMPOSITION FOR BLOCKING UV RAYS, AND METHOD FOR PRODUCING SUBSTRATE HAVING EMBOSSED SURFACE USING SAME
Document Type and Number:
WIPO Patent Application WO/2024/095560
Kind Code:
A1
Abstract:
The problems addressed are: to provide an ink composition for inkjet printing for blocking UV rays that is capable of forming a printed layer capable of suitably blocking UV rays; and to provide a method for producing a substrate having a desired embossed surface using said ink composition. Provided as a solution is an ink composition for inkjet printing for blocking UV rays, wherein the ink composition contains 55.0 mass% or more of a photopolymerizable monomer, from 3.0 mass% to less than 15.0 mass% of a UV absorber, and from 10.0 mass% to less than 30.0 mass% of a non-polymerizable material, and the content ratio of polyfunctional monomer in the photopolymerizable monomer is 50.0 mass% or more relative to the photopolymerizable monomer.

Inventors:
NAKASHIMA OKINORI (JP)
MYOSE TAKUYA (JP)
OGASAHARA KOKI (JP)
KAWAMOTO KENJI (JP)
NAKAMAE KOSUKE (JP)
Application Number:
PCT/JP2023/029744
Publication Date:
May 10, 2024
Filing Date:
August 17, 2023
Export Citation:
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Assignee:
SAKATA INX CORP (JP)
International Classes:
C09D11/101; B41J2/01; B41M5/00; B41M5/52; C09D11/30
Domestic Patent References:
WO2020039361A12020-02-27
WO2018069874A12018-04-19
Foreign References:
JP2019026748A2019-02-21
KR20210057400A2021-05-21
Attorney, Agent or Firm:
OCHANOMIZU INTERNATIONAL PATENT OFFICE (JP)
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