Title:
HOLLOW SILICA PARTICLES CONTAINING ALUMINUM ATOMS AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2024/096130
Kind Code:
A1
Abstract:
The present invention provides hollow silica particles which have high dispersion stability in a medium without a fear of effusion of an alkali metal, or the like. The hollow silica particles each have a space inside the outer shell and contain aluminum atoms that form aluminosilicate sites; and the aluminum atoms are bonded to the surfaces of the hollow silica particles at a ratio (A) of 100 to 20,000 ppm/SiO2 in terms of Al2O3 per 1 g of SiO2 as determined by measurement by means of a leaching method.
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Inventors:
NISHIMURA TOHRU (JP)
SHIMOYOSHI MANAMI (JP)
HIDA MASAHIRO (JP)
YAMADA SHUHEI (JP)
SHIMOYOSHI MANAMI (JP)
HIDA MASAHIRO (JP)
YAMADA SHUHEI (JP)
Application Number:
PCT/JP2023/039757
Publication Date:
May 10, 2024
Filing Date:
November 02, 2023
Export Citation:
Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
C01B33/12; C01B33/141; C01B33/145; C01B33/149; C09C1/28; C09C3/06
Attorney, Agent or Firm:
HANABUSA PATENT & TRADEMARK OFFICE (2 Kandasurugadai 3-chome, Chiyoda-k, Tokyo 62, JP)
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