Title:
HIGHER SECONDARY ALCOHOL ALKOXYLATE PRECURSOR, HIGHER SECONDARY ALCOHOL ALKOXYLATE ADDUCT, AND HIGHER SECONDARY ALKYL ETHER SULFURIC ACID ESTER SALT, AND PRODUCTION METHODS THEREFOR
Document Type and Number:
WIPO Patent Application WO/2021/049492
Kind Code:
A1
Abstract:
[Problem] A purpose of the present invention is to provide: a higher secondary alcohol alkoxylate adduct that when used as a surfactant, exhibits excellent cleaning power, and does not have unpleasant odor and is free from turbidity and separated products; and a higher secondary alkyl ether sulfuric acid ester salt that does not have unpleasant odor and has low skin-stimulating properties. Another purpose of the present invention is to provide production methods for a higher secondary alcohol polyalkoxylate and a higher secondary alkylether sulfuric acid ester salt. [Solution] This higher secondary alcohol alkoxylate precursor is obtained by reacting a long-chain olefin with a (poly)alkylene glycol, wherein the contained amount of the (poly)alkylene glycol is 0.2 mass% or less with respect to the total mass of the higher secondary alcohol alkoxylate. This higher secondary alcohol alkoxylate adduct is an alkylene oxide adduct of the higher secondary alcohol alkoxylate precursor. This higher secondary alkyl ether sulfuric acid ester salt is a sulfate of the higher secondary alcohol alkoxylate precursor or the higher secondary alcohol alkoxylate adduct.
Inventors:
OKADA ATSUSHI (JP)
INAOKA TORU (JP)
INAOKA TORU (JP)
Application Number:
PCT/JP2020/033959
Publication Date:
March 18, 2021
Filing Date:
September 08, 2020
Export Citation:
Assignee:
NIPPON CATALYTIC CHEM IND (JP)
International Classes:
C09K23/02; C07B61/00; C07C41/06; C07C41/30; C07C43/04; C07C43/11; C07C43/13; C07C303/24; C07C305/04; C09K23/42; C11D1/29; C11D1/72
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Other References:
JOURNAL OF SYNTHETIC ORGANIC CHEMISTRY, JAPAN, vol. 30, no. 10, 1972, pages 874
Attorney, Agent or Firm:
HATTA & ASSOCIATES (JP)
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