Title:
GAS TREATMENT METHOD AND GAS TREATMENT SYSTEM
Document Type and Number:
WIPO Patent Application WO/2024/024287
Kind Code:
A1
Abstract:
Provided are a gas treatment method and a gas treatment system with which it is possible to recover from any reduction in VOC treatment performance without requiring wiping work or the like by a worker. This method includes: a step (A) in which a gas being treated is introduced into a treatment space that constitutes part of a flow path in a state in which a discharge lamp is lit, the discharge lamp being disposed within the treatment space and emitting UV light having a main emission wavelength of 200 nm or lower; and a step (B) in which a purified gas that contains oxygen but substantially does not contain VOCs is introduced into the treatment space in a state in which the discharge lamp is lit after step (A) is implemented.
Inventors:
NISHIO KENGO (JP)
TERADA SHOICHI (JP)
NAITO KEISUKE (JP)
TERADA SHOICHI (JP)
NAITO KEISUKE (JP)
Application Number:
PCT/JP2023/021122
Publication Date:
February 01, 2024
Filing Date:
June 07, 2023
Export Citation:
Assignee:
USHIO ELECTRIC INC (JP)
International Classes:
A62D3/176; A61L9/20
Foreign References:
| JP2011056191A | 2011-03-24 | |||
| JP2009111208A | 2009-05-21 | |||
| JP2008000661A | 2008-01-10 | |||
| JPH07180861A | 1995-07-18 | |||
| JP2020185532A | 2020-11-19 |
Attorney, Agent or Firm:
KIMURA Masayoshi (JP)
Download PDF: