FILTER DEVICE

WIPO Patent Application WO/2024/080205

A1

A filter device 10 comprises: a first piezoelectric substrate 2A having a first main surface 2a and a second main surface 2b opposing each other; at least one first acoustic wave resonator 13A that includes an IDT electrode provided on the first main surface 2a of the first piezoelectric substrate 2A, the first acoustic wave resonator 13A being a series-arm resonator or a parallel-arm resonator; a support body 8A that is provided on the first main surface 2a of the first piezoelectric substrate 2A and is provided so as to surround the first acoustic wave resonator 13A; a second piezoelectric substrate 2B that is provided on the support body 8A and includes a third main surface 2c positioned on the first piezoelectric substrate 2A side and a fourth main surface 2d opposing the third main surface 2c; and at least one second acoustic wave resonator 13B that includes an IDT electrode provided on the third main surface 2c of the second piezoelectric substrate 2B, the second acoustic wave resonator 13B having at least one series-arm resonator. The electromechanical coupling coefficient Ksaw of the second piezoelectric substrate 2B is less than the electromechanical coupling coefficient Ksaw of the first piezoelectric substrate 2A. The at least one second acoustic wave resonator 13B includes a series-arm resonator that has the lowest anti-resonance frequency among all the series-arm resonators configured on the first piezoelectric substrate 2A and the second piezoelectric substrate 2B.

YAMAZAKI SUNAO (JP)
HAYASHI YASUNOBU (JP)
TANIGUCHI YASUMASA (JP)

PCT/JP2023/036224

April 18, 2024

October 04, 2023

Click for automatic bibliography generation  

MURATA MANUFACTURING CO (JP)

H03H9/25; H03H9/64

JP2017204743A	2017-11-16
JP2004173236A	2004-06-17

OSAKA FRONT (JP)

View/Download PDF      PDF Help

Previous Patent: CLEANING AGENT COMPOSITION AND PASTE CLEANING METHOD

Next Patent: GAS SENSOR AND GAS ALARM COMPRISING GAS SENSOR