Title:
ETCHANT COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2024/053623
Kind Code:
A1
Abstract:
Provided as one embodiment is an etchant composition having excellent storage stability. An embodiment of the present disclosure relates to an etchant composition for etching layers containing at least one metal, the etchant composition comprising nitric acid, a polyvalent amine having a number-average molecular weight of 300 or higher, a nitrogen-containing basic compound having a molecular weight less than 300, and water.
Inventors:
UCHIDA YOHEI
Application Number:
PCT/JP2023/032305
Publication Date:
March 14, 2024
Filing Date:
September 05, 2023
Export Citation:
Assignee:
KAO CORP (JP)
International Classes:
H01L21/308; H01L21/306
Foreign References:
| JP2014232874A | 2014-12-11 | |||
| JP2015144230A | 2015-08-06 |
Attorney, Agent or Firm:
IKEUCHI & PARTNERS (JP)
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