Title:
ETCHANT COMPOSITION FOR PREPARING GRAPHENE HAVING LOW SHEET RESISTANCE
Document Type and Number:
WIPO Patent Application WO/2023/128047
Kind Code:
A1
Abstract:
The present invention relates to an etchant composition for preparing graphene having low sheet resistance, and more particularly, to a composition containing sulfuric acid, hydrogen peroxide, an N-heterocyclic aromatic compound, aromatic boric acid, and purified water. The etchant composition containing the ingredients has the effect of significantly reducing the sheet resistance of graphene prepared by means of chemical vapor deposition (CVD).
Inventors:
MOON JONG TAIK (KR)
KWON YOUNG DUCK (KR)
YOO BYONG WOOK (KR)
LEE SANG MIN (KR)
MOON SEUNG IL (KR)
KIM KI SOO (KR)
LEE GYU HYUN (KR)
HYUN DA SOM (KR)
SHIM SU JIN (KR)
KWON YOUNG DUCK (KR)
YOO BYONG WOOK (KR)
LEE SANG MIN (KR)
MOON SEUNG IL (KR)
KIM KI SOO (KR)
LEE GYU HYUN (KR)
HYUN DA SOM (KR)
SHIM SU JIN (KR)
Application Number:
PCT/KR2022/001082
Publication Date:
July 06, 2023
Filing Date:
January 21, 2022
Export Citation:
Assignee:
GRAPHENELAB CO LTD (KR)
International Classes:
C09K13/06; C01B32/194; C09K13/10
Foreign References:
| KR101850112B1 | 2018-04-19 | |||
| KR20120044630A | 2012-05-08 | |||
| KR20180085606A | 2018-07-27 | |||
| KR20130028582A | 2013-03-19 | |||
| KR20180048344A | 2018-05-10 |
Attorney, Agent or Firm:
TAEDONG PATENT & LAW FIRM (KR)
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