DRYING APPARATUS AND METHOD FOR DRYING SUBSTRATE USING SUPERCRITICAL FLUID

WIPO Patent Application WO/2024/078217

A1

The invention discloses a drying apparatus and method for drying a substrate using a supercritical fluid. The drying apparatus comprises: an upper cavity, a lower cavity, a substrate tray, a jacking mechanism, a connecting assembly, and a locking mechanism; the lower cavity is disposed below the upper cavity; the substrate tray is disposed in the lower cavity and is used for bearing the substrate; the jacking mechanism is disposed below the lower cavity and is used for driving the lower cavity to move in the vertical direction, causing the lower cavity to be completely in contact with the upper cavity; the connecting assembly is connected to the upper cavity and the lower cavity, and the locking mechanism is used for locking or releasing the connecting assembly when the lower cavity is completely in contact with the upper cavity; when the locking mechanism locks the connecting assembly, after the jacking mechanism has moved away from the lower cavity, the locking mechanism and the connecting assembly automatically come into contact one above the other as a result of the gravitational effect on the cavities, and the upper cavity and the lower cavity close, forming a sealed chamber. The present invention has the advantage of enhancing the pressure resistance of the sealed chamber.

SUN YINGNAN (CN)
YANG PEIXIAN (CN)
LI BIN (CN)
HE BIN (CN)
CHEN GUOQIANG (CN)
JIA SHENA (CN)
ZHANG XIAOYAN (CN)
WANG WENJUN (CN)
JIN YINHUA (CN)
WANG HUI (CN)

PCT/CN2023/117639

April 18, 2024

September 08, 2023

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ACM RES SHANGHAI INC (CN)

F26B5/04

CN103151285A	2013-06-12
CN112038261A	2020-12-04
CN114068364A	2022-02-18
US20130025155A1	2013-01-31
KR20210004382A	2021-01-13

SHANGHAI PATENT & TRADEMARK LAW OFFICE, LLC (CN)

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