Title:
DEVICE AND METHOD FOR WASHING OFF REACTANT RESIDUES OF POLYMERS
Document Type and Number:
WIPO Patent Application WO/2017/073875
Kind Code:
A1
Abstract:
The present invention relates to a device and a method for washing off the reactant residues of polymers and, more specifically, provides a device and a method for washing off the reactant residues of polymers, the method and the device pressing the polymer itself by using external pressure instead of a general agitation method, so as to form a bulk flow of fluid in the polymer, thereby effectively removing the reactant residues present on the surface and in the pores of the polymer.
Inventors:
RYU HYUN WOOG (KR)
HAN JOONG JIN (KR)
LEE JONG MIN (KR)
JEONG DONG HWI (KR)
SON SANG HWAN (KR)
HAN JOONG JIN (KR)
LEE JONG MIN (KR)
JEONG DONG HWI (KR)
SON SANG HWAN (KR)
Application Number:
PCT/KR2016/006110
Publication Date:
May 04, 2017
Filing Date:
June 09, 2016
Export Citation:
Assignee:
LG CHEMICAL LTD (KR)
UNIV SEOUL NAT R & DB FOUND (KR)
UNIV SEOUL NAT R & DB FOUND (KR)
International Classes:
C08J11/02; C08G85/00
Foreign References:
| JP2002037919A | 2002-02-06 | |||
| KR101006745B1 | 2011-01-10 | |||
| JP2007007622A | 2007-01-18 | |||
| JPH0749485B2 | 1995-05-31 | |||
| JPH07108532A | 1995-04-25 |
Attorney, Agent or Firm:
CHUNG, Soon-Sung (KR)
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