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Title:
COPOLYMER HAVING CARBOSILOXANE DENDRIMER STRUCTURE, AND COMPOSITION, COSMETIC INGREDIENT, COATING FORMING AGENT, AND COSMETIC CONTAINING SAME
Document Type and Number:
WIPO Patent Application WO/2020/203145
Kind Code:
A1
Abstract:
[Problem] To provide: a copolymer having a carbosiloxane dendrimer structure, the copolymer being characterized by containing a dramatically reduced amount of monomer having a carbosiloxane dendrimer structure; a composition, cosmetic ingredient, coating forming agent, and cosmetic containing the same; and a method for producing said copolymer, etc. [Solution] The present invention pertains to: a copolymer of (a1) an unsaturated monomer having a carbosiloxane dendrimer structure comprising a radical-polymerizable organic group and (a2) an unsaturated monomer, different from component (a1), comprising a radical-polymerizable vinyl group, the copolymer containing no more than 2,500 ppm unreacted unsaturated monomer (a1) and saturated monomer originating from the unreacted unsaturated monomer (a1); and uses for the same.

Inventors:
SOUDA TATSUO (JP)
SUGIURA TSUNEHITO (JP)
KENNOKI MASAKADO (JP)
MATSUBA MASASHI (JP)
Application Number:
PCT/JP2020/010836
Publication Date:
October 08, 2020
Filing Date:
March 12, 2020
Export Citation:
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Assignee:
DOW TORAY CO LTD (JP)
International Classes:
C08F6/10; A61K8/31; A61K8/34; A61K8/891; A61Q1/00; A61Q15/00; A61Q17/04; A61Q19/00; C08F2/00; C08F220/18; C08F230/08; C08K5/05; C08L43/04; C08L91/00
Domestic Patent References:
WO2011049246A12011-04-28
WO2009022621A12009-02-19
WO2011049246A12011-04-28
WO2011049248A12011-04-28
Foreign References:
JP2000063225A2000-02-29
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Other References:
See also references of EP 3950727A4
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