Title:
COMPOSITION, SLURRY FOR POSITIVE ELECTRODE, AND BATTERY
Document Type and Number:
WIPO Patent Application WO/2020/162503
Kind Code:
A1
Abstract:
Provided are: a composition that serves as a binder having well-balanced peel/adhesion strength, high discharge capacity retention rate, and penetration resistance; a slurry that is for a positive electrode and that uses the composition; and a secondary battery. The composition according to the present invention contains a graft copolymer. The graft copolymer has a backbone polymer and a plurality of branch polymers. The backbone polymer has a polyvinyl alcohol structure. A first monomeric unit and a second monomeric unit are each included in at least one of the plurality of branch polymers. The second monomeric unit is different from the first monomeric unit. In the composition, when the contained amount of the polyvinyl alcohol structure in the composition is defined as CPVA mass% and the total amount of the first monomeric unit and the second monomeric unit contained in the composition is defined as CM mass%, the ratio (CPVA/(CM + CPVA)) of the contained amount of the polyvinyl alcohol structure with respect to the total amount of the first monomeric unit and the second monomeric unit is 0.05-0.7. The composition has a swelling degree of 200-900% in propylene carbonate.
Inventors:
NAKANISHI SOICHIRO (JP)
NARUTOMI TAKUYA (JP)
SUZUKI SHIGERU (JP)
WATANABE JUN (JP)
NARUTOMI TAKUYA (JP)
SUZUKI SHIGERU (JP)
WATANABE JUN (JP)
Application Number:
PCT/JP2020/004403
Publication Date:
August 13, 2020
Filing Date:
February 05, 2020
Export Citation:
Assignee:
DENKA COMPANY LTD (JP)
International Classes:
C08F261/04; C08L51/08; C08L101/00; H01M4/13; H01M4/131; H01M4/139; H01M4/1391; H01M4/505; H01M4/525; H01M4/62
Domestic Patent References:
| WO2015053224A1 | 2015-04-16 | |||
| WO2018230599A1 | 2018-12-20 | |||
| WO2012115096A1 | 2012-08-30 | |||
| WO2015053224A1 | 2015-04-16 |
Foreign References:
| JPS4948190A | 1974-05-10 | |||
| JPH01171882A | 1989-07-06 | |||
| JPH08277211A | 1996-10-22 | |||
| JP2001329485A | 2001-11-27 | |||
| JP2010521798A | 2010-06-24 | |||
| JPH0931138A | 1997-02-04 | |||
| JP2013211161A | 2013-10-10 | |||
| JP4845272B2 | 2011-12-28 | |||
| JP2013098123A | 2013-05-20 | |||
| JP2013084351A | 2013-05-09 |
Other References:
See also references of EP 3922653A4
Attorney, Agent or Firm:
SK INTELLECTUAL PROPERTY LAW FIRM et al. (JP)
Download PDF: