Title:
COMPOSITION FOR CLEANING METAL MASK AND CLEANING METHOD USING SAME
Document Type and Number:
WIPO Patent Application WO/2023/211110
Kind Code:
A1
Abstract:
The present invention relates to a composition for cleaning a metal mask and a cleaning method using same. Particularly, disclosed are: a composition for cleaning a metal mask, comprising 70 to 90 wt% of a phosphonic acid metal chelating agent based on the total weight of the composition, and the residual amount of water; and a method for cleaning a metal mask using the composition for cleaning.
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Inventors:
SIM HYUN HO (KR)
KIM CHANG KYU (KR)
CHO JUN HWI (KR)
PARK EUN JI (KR)
KIM CHANG KYU (KR)
CHO JUN HWI (KR)
PARK EUN JI (KR)
Application Number:
PCT/KR2023/005599
Publication Date:
November 02, 2023
Filing Date:
April 25, 2023
Export Citation:
Assignee:
MTI CO LTD (KR)
International Classes:
C11D7/36; B05D3/12; B05D7/24; B08B3/08; B08B3/12; C11D11/00; G03F7/42; H01L21/02
Domestic Patent References:
| WO2007010679A1 | 2007-01-25 |
Foreign References:
| KR20080011243A | 2008-01-31 | |||
| KR20120029526A | 2012-03-27 | |||
| KR20180009021A | 2018-01-25 | |||
| KR20100051839A | 2010-05-18 |
Attorney, Agent or Firm:
Y.P.LEE, MOCK & PARTNERS (KR)
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