Title:
COMBINED ETCHING LIQUID, ETCHING SYSTEM AND ETCHING METHOD
Document Type and Number:
WIPO Patent Application WO/2023/060792
Kind Code:
A1
Abstract:
A combined etching liquid, an etching system and an etching method of the present invention can be applied to the wet etching of a non-conductive thin film in semiconductor manufacturing. The combined etching liquid comprises a first etching liquid and a second etching liquid, wherein the first etching liquid is used for etching a non-conductive thin film, and the second etching liquid contains a component which can remove the reaction product of the etching of the non-conductive thin film with the first etching liquid; or a third etching liquid is present therein and contains a component used for removing another etching product of the first etching liquid, so as to prolong the service life of the first etching liquid. By taking the combined etching liquid for etching silicon nitride as an example, the first etching liquid contains phosphoric acid, and the second etching liquid contains a fluorine-containing compound; in combination with an etching apparatus, the temperature and the water content of an etching liquid in a mixing reaction chamber are adjusted, and a specific removable fluorine-silicon compound can be generated from the fluorine-containing compound by means of reaction with a phosphoric acid etching product, i.e. a silicon compound, such that the service life of the first etching liquid can be prolonged, the acid changing operation can be reduced, and the production efficiency can be improved.
Inventors:
WU XIANG (CN)
LI WEIMIN (CN)
LI WEIMIN (CN)
Application Number:
PCT/CN2022/070658
Publication Date:
April 20, 2023
Filing Date:
January 07, 2022
Export Citation:
Assignee:
SHANGHAI INST MICROSYSTEM & INFORMATION TECH CAS (CN)
International Classes:
C09K13/06; C09K13/08; H01L21/311; H01L21/67
Foreign References:
| CN104517827A | 2015-04-15 | |||
| JP2003338486A | 2003-11-28 | |||
| CN106185854A | 2016-12-07 | |||
| CN109135752A | 2019-01-04 | |||
| CN102569015A | 2012-07-11 | |||
| CN105575762A | 2016-05-11 | |||
| CN1713359A | 2005-12-28 | |||
| CN101140374A | 2008-03-12 | |||
| CN101303976A | 2008-11-12 | |||
| CN111180352A | 2020-05-19 | |||
| CN113614890A | 2021-11-05 | |||
| TW201541510A | 2015-11-01 | |||
| JP2007305894A | 2007-11-22 | |||
| JP2004134780A | 2004-04-30 |
Attorney, Agent or Firm:
J.Z.M.C. PATENT AND TRADEMARK LAW OFFICE (CN)
Download PDF:
Previous Patent: SOFT MAGNETIC COMPOSITE AND PREPARATION METHOD THEREFOR
Next Patent: NOISE REDUCTION METHOD, CHIP, CHIP MODULE, AND DEVICE
Next Patent: NOISE REDUCTION METHOD, CHIP, CHIP MODULE, AND DEVICE