Title:
CLEANING BASE STATION FOR CLEANING DEVICE AND CLEANING SYSTEM HAVING SAME
Document Type and Number:
WIPO Patent Application WO/2024/056033
Kind Code:
A1
Abstract:
A cleaning base station (100) for a cleaning device and a cleaning system having same, the cleaning base station (100) comprising: a base station base (1), cleaning members (2) and a filtering assembly. The base station base (1) is provided with cleaning basins (111). The cleaning members (2) can be movably arranged in the cleaning basins (111). The filtering assembly is arranged in the cleaning basins (111). The cleaning basins (111) can be cleaned by means of the movement of the cleaning members (2), so that the accumulation of solid dirt on inner walls of the cleaning basins (111) can be effectively prevented, thereby improving the cleanliness of the cleaning basins (111).
Inventors:
SUN TAO (CN)
XU JIANQIANG (CN)
ZHU XIAOGANG (CN)
ZHANG DING (CN)
ZHU JINZHONG (CN)
WANG FEI (CN)
XU JIANQIANG (CN)
ZHU XIAOGANG (CN)
ZHANG DING (CN)
ZHU JINZHONG (CN)
WANG FEI (CN)
Application Number:
PCT/CN2023/118861
Publication Date:
March 21, 2024
Filing Date:
September 14, 2023
Export Citation:
Assignee:
MIDEA ROBOZONE TECH CO LTD (CN)
International Classes:
A47L9/28; A47L9/00; A47L11/00
Foreign References:
| CN217118359U | 2022-08-05 | |||
| CN216823295U | 2022-06-28 | |||
| CN215191307U | 2021-12-17 | |||
| CN217365723U | 2022-09-06 | |||
| CN218128421U | 2022-12-27 | |||
| US20150182089A1 | 2015-07-02 |
Attorney, Agent or Firm:
BEIJING LISENG INTELLECTUAL PROPERTY AGENCY LTD. (CN)
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