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Title:
CHLOROPRENE-BASED POLYMER LATEX COMPOSITION, AND DIP-MOLDED ARTICLE
Document Type and Number:
WIPO Patent Application WO/2023/058526
Kind Code:
A1
Abstract:
The present invention provides a chloroprene-based polymer latex composition by which can be obtained, through the use of a hetero-aromatic ring-based compound and the plasticizing effect of a low molecular weight polymer, a chloroprene-based polymer dip-molded article having high rupture strength while maintaining excellent flexibility even with a reduction in a vulcanization accelerator and sulfur, and having a low residue amount of mercaptans for which concerns remain regarding hygienic properties. The chloroprene-based polymer latex composition according to the present invention comprises a chloroprene-based polymer latex, a metal oxide, and a hetero-aromatic ring-based compound. The chloroprene-based polymer latex composition comprises 0.5-15.0 parts by mass of the metal oxide and 0.1-10.0 parts by mass of the hetero-aromatic ring-based compound per 100 parts by mass of solid content of the chloroprene-based polymer latex. The chloroprene-based polymer latex composition has a content of alkyl mercaptan compounds of 0.34 parts by mass or less per 100 parts by mass of solid content of the chloroprene-based polymer latex, and the hetero-aromatic ring-based compound is represented by chemical formula (1).

Inventors:
ITO MISAKI (JP)
KUMAGAI YUSHI (JP)
KATO MASAHIRO (JP)
Application Number:
PCT/JP2022/036220
Publication Date:
April 13, 2023
Filing Date:
September 28, 2022
Export Citation:
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Assignee:
DENKA COMPANY LTD (JP)
International Classes:
C08L11/02; C08F36/18; C08K3/22; C08K5/3447
Domestic Patent References:
WO2020230746A12020-11-19
WO2020189516A12020-09-24
WO2019009038A12019-01-10
Foreign References:
JPH08188676A1996-07-23
JPH07292165A1995-11-07
JP2014114342A2014-06-26
JP2019143002A2019-08-29
Attorney, Agent or Firm:
SK INTELLECTUAL PROPERTY LAW FIRM et al. (JP)
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