Title:
BUFF FOR POLISHING
Document Type and Number:
WIPO Patent Application WO/2022/014208
Kind Code:
A1
Abstract:
A buff for polishing 1 comprises a polishing member 11 which includes a polishing surface 111 and a resin member 12 which is fixed to a surface of the polishing member 11 on the opposite side of the polishing surface 111 and in which a gap 121 is formed, wherein the gap 121 includes a plurality of regions which are formed along a lamination direction of the polishing member 11 and the resin member 12, and are different in maximum length of the gap 121 in a direction parallel with the polishing surface 111. Moreover, the gap 121 includes a region that has the maximum length increasing in the lamination direction toward a position of contact with the polishing member 11.
Inventors:
SHIMIZU KOICHI (JP)
Application Number:
PCT/JP2021/021872
Publication Date:
January 20, 2022
Filing Date:
June 09, 2021
Export Citation:
Assignee:
FE TRADE CO LTD (JP)
OOMIYA BUFF INC (JP)
OOMIYA BUFF INC (JP)
International Classes:
B24D13/14
Foreign References:
| US20100151772A1 | 2010-06-17 | |||
| JPS55156862U | 1980-11-11 | |||
| JPS59227367A | 1984-12-20 |
Attorney, Agent or Firm:
IZUMI Michihiro (JP)
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