Title:
AUTOMATED THIN FILM DEPOSITION SYSTEM UTILIZING MACHINE LEARNING AND THIN FILM DEPOSITION METHOD
Document Type and Number:
WIPO Patent Application WO/2024/075909
Kind Code:
A1
Abstract:
Disclosed are an automated thin film deposition system utilizing machine learning and a thin film deposition method. The automated thin film deposition system utilizing machine learning disclosed herein is disposed in a chamber for thin film deposition and may comprise: a substrate holder on which is placed a substrate on which a thin film is to be deposited; a temperature control device for controlling the temperature of the substrate placed on the substrate holder; a raw material supply device for supplying raw materials, for the deposition of the thin film, to the substrate placed on the substrate holder; an analysis device for analyzing physical properties of the thin film deposited on the substrate; a removal device configured to remove the thin film from the substrate; and a control device connected to the temperature control device, the raw material supply device, the analysis device, and the removal device, the control device including a processor that can process data obtained from the analysis device and learn the correlation between process variables for the thin film deposition and the physical properties of the thin film using machine learning.
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Inventors:
YI GYU CHUL (KR)
SUH WON WOO (KR)
SUH WON WOO (KR)
Application Number:
PCT/KR2023/002571
Publication Date:
April 11, 2024
Filing Date:
February 23, 2023
Export Citation:
Assignee:
SEOUL NAT UNIV R&DB FOUNDATION (KR)
International Classes:
C23C16/52; C23C14/54; C23C14/58; C23C16/448; C23C16/46; C23C16/56; C30B25/16
Foreign References:
| JPH06235079A | 1994-08-23 | |||
| KR101965605B1 | 2019-08-13 | |||
| US20220293442A1 | 2022-09-15 | |||
| JP2022016279A | 2022-01-21 | |||
| US20180082826A1 | 2018-03-22 | |||
| KR20020005839A | 2002-01-18 |
Attorney, Agent or Firm:
KIM, Kwonseok (KR)
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