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Title:
APPARATUSES FOR SUPPLYING CLEANING LIQUID AND SILICON WAFER CLEANING MACHINES INCLUDING THE SAME
Document Type and Number:
WIPO Patent Application WO/2023/237131
Kind Code:
A1
Abstract:
An apparatus for supplying cleaning liquid may include: a stock solution unit configured with a plurality of stock solution tanks; a cleaning unit configured with a plurality of cleaning tanks; and a transfer unit disposed between the stock solution unit and the cleaning unit. The transfer unit is configured with a plurality of independent transfer tanks. Each of the stock solution tanks communicates with at least one of the transfer tanks, each of the transfer tanks communicates with one of the cleaning tanks, and each of the cleaning tanks communicates with at least one of the transfer tanks.

Inventors:
JIN LIHUI (CN)
YANG HUA (CN)
REN ZHIGAO (CN)
WANG HUAN (CN)
AI CHUANLING (CN)
WANG DAWEI (CN)
WU ZHIJUN (CN)
CEN HONGXIA (CN)
WEI CHEN (CN)
Application Number:
PCT/CN2023/110433
Publication Date:
December 14, 2023
Filing Date:
July 31, 2023
Export Citation:
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Assignee:
TCL ZHONGHUAN RENEWABLE ENERGY TECH CO LTD (CN)
International Classes:
B08B3/04; B01F23/40
Foreign References:
CN217393146U2022-09-09
CN111477571A2020-07-31
CN103521105A2014-01-22
CN100998971A2007-07-18
CN108687039A2018-10-23
CN204503659U2015-07-29
JPH06194807A1994-07-15
KR101747035B12017-06-14
Attorney, Agent or Firm:
PURPLEVINE INTELLECTUAL PROPERTY (SHENZHEN) CO., LTD. (CN)
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