Title:
ANTIVIRAL BASE MATERIAL AND MASK
Document Type and Number:
WIPO Patent Application WO/2023/062956
Kind Code:
A1
Abstract:
Provided are an antiviral base material and a mask with which the quality of the antiviral base material can be ensured. An antiviral base material 20 has antiviral properties and comprises a first base material 21 made of paper and an antiviral layer 22 formed by applying tea leaf extract substances extracted from tea leaves to the first base material 21, the amount of tea leaf extract substances applied in the antiviral layer 22 being 0.1 g/m2 or more, and the tea leaf extract substances including catechin, epicatechin, epigallocatechin, epicatechin gallate, epigallocatechin gallate, theaflavin, theaflavin-3-O-gallate, theaflavin-3'-O-gallate, and theaflavin-3,3'-digallate.
Inventors:
IKAWA HIROAKI (JP)
OOYAMA HIROSHI (JP)
KASHIWADA SHOSAKU (JP)
YOKOTA HIROSHI (JP)
KUNITAKE TETSUNORI (JP)
OOYAMA HIROSHI (JP)
KASHIWADA SHOSAKU (JP)
YOKOTA HIROSHI (JP)
KUNITAKE TETSUNORI (JP)
Application Number:
PCT/JP2022/032395
Publication Date:
April 20, 2023
Filing Date:
August 29, 2022
Export Citation:
Assignee:
KAMI SHOJI CO LTD (JP)
International Classes:
A41D13/11
Foreign References:
| JP3226529U | 2020-07-02 | |||
| JP2002136615A | 2002-05-14 |
Attorney, Agent or Firm:
SAITO TATSUYA (JP)
Download PDF:
Previous Patent: LAYERED FILM, FILM FOR PROTECTED HORTICULTURE, AND KNITTED FABRIC
Next Patent: OPTICAL DEFLECTION DEVICE AND RANGE MEASURING DEVICE
Next Patent: OPTICAL DEFLECTION DEVICE AND RANGE MEASURING DEVICE