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Title:
AMORPHOUS NANOCRYSTALLINE ALLOY STRIP HAVING HIGH LAMINATION FACTOR, FABRICATION METHOD THEREFOR AND APPLICATION THEREOF
Document Type and Number:
WIPO Patent Application WO/2022/105079
Kind Code:
A1
Abstract:
An amorphous nanocrystalline alloy strip having a high lamination factor, a fabrication method therefor and an application thereof. In the width direction of the amorphous nanocrystalline alloy strip having a high lamination factor, the thickness H0 of the middle portion of the strip is greater than the thicknesses HL and HR of the two side edges of the strip, and the difference is no greater than 2.5 micrometers. By improving the shape of the amorphous nanocrystalline alloy strip, the thicknesses of the middle portion and the thickness of the two side edges of the strip are controlled, and the roughness of a roller surface and a free surface of the strip are also improved, such that a lamination factor of the amorphous nanocrystalline alloy strip of over 90% is achieved.

Inventors:
CHEN WENZHI (CN)
LIU GUODONG (CN)
LI BAISONG (CN)
SHI YANG (CN)
LI ZHIGANG (CN)
Application Number:
PCT/CN2021/080904
Publication Date:
May 27, 2022
Filing Date:
March 16, 2021
Export Citation:
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Assignee:
AT&M AMORPHOUS TECH CO LTD (CN)
ADVANCED TECH & MATERIALS CO LTD (CN)
International Classes:
H01F1/153; B22D11/06; C22C45/02; H01F1/16; H01F27/245; H01F41/02
Domestic Patent References:
WO2019138730A12019-07-18
Foreign References:
CN1065156A1992-10-07
CN111739706A2020-10-02
CN1270861A2000-10-25
CN104060199A2014-09-24
Attorney, Agent or Firm:
BEIJING IPLING INTELLECTUAL PROPERTY LAW FIRM (CN)
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