ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD

WIPO Patent Application WO/2024/080200

A1

Provided are: an active-ray-sensitive or radiation-sensitive resin composition comprising a resin (A) that includes an acid-decomposable group and a phenolic hydroxyl group, a resin (B) that does not contain an acid-decomposable group, an acid generator (C), and an acid diffusion control agent (D), wherein the resin (B) includes a repeating unit (b1) having a hydrophilic group and a fluorine atom, the hydrophilic group and the fluorine atom in the repeating unit (b1) are covalently bonded to a main chain of the resin (B) or are covalently bonded to a side chain that is covalently bonded to the main chain of the resin (B), and the resin (B) does not contain an ammonium salt structure; and an active-ray-sensitive or radiation-sensitive film, a pattern formation method, and an electronic device manufacturing method which use said active-ray-sensitive or radiation-sensitive resin composition.

JP2012012593	POLYMER AND RESIST COMPOSITION
JP2024009780	Salt, acid generator, resist composition, and method for producing resist pattern
JP3890699	POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND ITS PRODUCTION

TAKAHASHI KOTARO (JP)
KAMINO YUKA (JP)

PCT/JP2023/036196

April 18, 2024

October 04, 2023

Click for automatic bibliography generation  

FUJIFILM CORP (JP)

G03F7/039; C08F212/14; C08F220/24; G03F7/20

JP2008122932A	2008-05-29
JP2010176036A	2010-08-12
JP2007297500A	2007-11-15

KOH-EI, P.C. (JP)

View/Download PDF      PDF Help

Previous Patent: ABNORMALITY DETECTION DEVICE

Next Patent: DISTANCE MEASUREMENT SYSTEM, COMMUNICATION STATION, AND DISTANCE MEASUREMENT METHOD