Title:
ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND POLYMER
Document Type and Number:
WIPO Patent Application WO/2024/048462
Kind Code:
A1
Abstract:
The present invention provides an actinic-ray-sensitive or radiation-sensitive resin composition comprising (A) an onium salt compound and (B) a polymer which has a repeating unit including an acid group having an acidic proton and in which the main chain breaks down at irradiation with actinic rays or radioactive rays. The polymer has a repeating unit represented by a specific general formula. The present invention also provides: a resist film; a pattern formation method; a method for producing an electronic device, the method including the pattern formation method; and a polymer useful for the actinic-ray-sensitive or radiation-sensitive resin composition.
Inventors:
ISHIJI YOHEI (JP)
TAKAHASHI SATOMI (JP)
KAWABATA TAKESHI (JP)
GOTO AKIYOSHI (JP)
TAKAHASHI SATOMI (JP)
KAWABATA TAKESHI (JP)
GOTO AKIYOSHI (JP)
Application Number:
PCT/JP2023/030782
Publication Date:
March 07, 2024
Filing Date:
August 25, 2023
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/039; C08F212/14; C08F220/10; G03F7/20
Domestic Patent References:
| WO2021220851A1 | 2021-11-04 |
Foreign References:
| JP2002006497A | 2002-01-09 | |||
| JP2017088848A | 2017-05-25 | |||
| JPH1195436A | 1999-04-09 | |||
| JPH04127159A | 1992-04-28 |
Attorney, Agent or Firm:
KOH-EI, P.C. (JP)
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