Title:
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, COMPOUND, AND RESIN
Document Type and Number:
WIPO Patent Application WO/2023/157526
Kind Code:
A1
Abstract:
Provided are an actinic ray-sensitive or radiation-sensitive resin composition and the like that can form a pattern in which occurrence of defects is suppressed. The present invention pertains to: an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) including a repeating unit (a1) that has a partial structure in which a phenolic hydroxyl group is protected with a structure represented by a specific general formula (1); an actinic ray-sensitive or radiation-sensitive resin film formed by the actinic ray-sensitive or radiation-sensitive resin composition; a pattern formation method and an electronic device manufacturing method in which the actinic ray-sensitive or radiation-sensitive resin composition is used; and a compound and a resin that are suitably used for the actinic ray-sensitive or radiation-sensitive resin composition.
Inventors:
YOSHIMURA TSUTOMU (JP)
HATAKEYAMA NAOYA (JP)
GOTO AKIYOSHI (JP)
HATAKEYAMA NAOYA (JP)
GOTO AKIYOSHI (JP)
Application Number:
PCT/JP2023/000984
Publication Date:
August 24, 2023
Filing Date:
January 16, 2023
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/039; C08F12/02; C08F32/08; C08F220/12; G03F7/038
Domestic Patent References:
| WO2019156008A1 | 2019-08-15 |
Foreign References:
| JP2009086354A | 2009-04-23 | |||
| JP2008046269A | 2008-02-28 | |||
| JP2008046268A | 2008-02-28 | |||
| JP2006507403A | 2006-03-02 | |||
| JP2007237517A | 2007-09-20 | |||
| JP2009155372A | 2009-07-16 | |||
| JPS60179406A | 1985-09-13 |
Other References:
NISHIKUBO TADATOMI, SHIMOKAWA TUTOMU, HIRANO TOSHIYUKI, SHIINA ATUSHI: "A novel insertion reaction of epoxy compounds into phenyl ester linkages in polymer chains", JOURNAL OF POLYMER SCIENCE PART A: POLYMER CHEMISTRY, JOHN WILEY & SONS, INC., US, vol. 27, no. 8, 1 July 1989 (1989-07-01), US , pages 2519 - 2530, XP093086135, ISSN: 0887-624X, DOI: 10.1002/pola.1989.080270804
ZHOU QI-FENG, WAN XINHUA, ZHU XIN-LONG, ZHANG FEI, FENG XINDE: "Restudy of the Old Poly-2,5-di(benzoyloxy)styrene as a New Liquid Crystal Polymer", MOLECULAR CRYSTALS AND LIQUID CRYSTALS, TAYLOR & FRANCIS INC., US, vol. 231, no. 1, 24 July 1993 (1993-07-24), US , pages 107 - 117, XP009548741, ISSN: 1058-725X, DOI: 10.1080/10587259308032497
ZHOU QI-FENG, WAN XINHUA, ZHU XIN-LONG, ZHANG FEI, FENG XINDE: "Restudy of the Old Poly-2,5-di(benzoyloxy)styrene as a New Liquid Crystal Polymer", MOLECULAR CRYSTALS AND LIQUID CRYSTALS, TAYLOR & FRANCIS INC., US, vol. 231, no. 1, 24 July 1993 (1993-07-24), US , pages 107 - 117, XP009548741, ISSN: 1058-725X, DOI: 10.1080/10587259308032497
Attorney, Agent or Firm:
KOH-EI, P.C. et al. (JP)
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